发明名称 |
Method and apparatus for measuring the thicknesses of thin layers by means of x-ray fluorescence |
摘要 |
The invention relates to a method for measuring the thicknesses of thin layers by X-ray fluorescence, in which a specimen having the layer to be studied is positioned in view and subsequently X-radiation is directed onto the layer to be studied and emitted fluorescent radiation is detected by means of a radiation detector and the layer thickness is determined, in which on positioning the specimen there is a focussing by adjusting a focussing element along its optical axis and the position of the focussing element is determined with the layer in focus. An apparatus for layer thickness measurement with X-ray fluorescence according to the invention having a X-ray tube, a detector and an observing device with a focussing element provides for the latter to be movably mounted along its optical axis and provided with a position measuring device. This obviates the need for having to move a workpiece-carrying table in such a way that the work surface comes to rest at a predetermined, specific measuring distance or spacing.
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申请公布号 |
US6038280(A) |
申请公布日期 |
2000.03.14 |
申请号 |
US19980038820 |
申请日期 |
1998.03.12 |
申请人 |
HELMUT FISCHER GMBH & CO. INSTITUT FUR ELECTRONIK UND MESSTECHNIK |
发明人 |
ROESSIGER, VOLKER;KAISER, KARL-HEINZ |
分类号 |
G01B15/02;G01N23/223;(IPC1-7):G01B15/02 |
主分类号 |
G01B15/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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