发明名称 Sulfonyloximes for i-line photoresists of high sensitivity and high resist thickness
摘要 A composition which can be activated by light, at least one compound which may be crosslinked by the action of an acid and/or at least one compound which changes its solubility under the action of an acid, and as photoinitiator at least one compound generating an acid under the exposure of light of a wavelength of 240 to 390 nm and having a molar extinction coefficient e below 10 at i-line (365 nm) such compositions may be suitable for the preparation of negative and positive photoresists, printing plates, image recording materials or colour filters. Preferably, the photoinitiator is an oxime sulfonate having a structural unit of Formula I:
申请公布号 AU4452799(A) 申请公布日期 2000.03.09
申请号 AU19990044527 申请日期 1999.08.17
申请人 CIBA SPECIALTY CHEMICALS HOLDING INC. 发明人
分类号 H01L21/027;G03F7/004;G03F7/038;G03F7/039 主分类号 H01L21/027
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