A process for forming a nanoporous dielectric coating on a substrate. The process includes either (i) combining a stream of an alkoxysilane composition with a stream of a base containing catalyst composition to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate and exposing the combined composition to water (in either order or simultaneously); and curing the combined composition; or (ii) combining a stream of an alkoxysilane composition with a stream of water to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate; and curing the combined composition.
申请公布号
WO0013220(A1)
申请公布日期
2000.03.09
申请号
WO1999US18333
申请日期
1999.08.13
申请人
ALLIEDSIGNAL INC.
发明人
WU, HUI-JUNG;DRAGE, JAMES, S.;BRUNGARDT, LISA, BETH;RAMOS, TERESA;SMITH, DOUGLAS, M.