发明名称 NANOPOROUS SILICA VIA COMBINED STREAM DEPOSITION
摘要 A process for forming a nanoporous dielectric coating on a substrate. The process includes either (i) combining a stream of an alkoxysilane composition with a stream of a base containing catalyst composition to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate and exposing the combined composition to water (in either order or simultaneously); and curing the combined composition; or (ii) combining a stream of an alkoxysilane composition with a stream of water to form a combined composition stream; immediately depositing the combined composition stream onto a surface of a substrate; and curing the combined composition.
申请公布号 WO0013220(A1) 申请公布日期 2000.03.09
申请号 WO1999US18333 申请日期 1999.08.13
申请人 ALLIEDSIGNAL INC. 发明人 WU, HUI-JUNG;DRAGE, JAMES, S.;BRUNGARDT, LISA, BETH;RAMOS, TERESA;SMITH, DOUGLAS, M.
分类号 C08J7/06;C08G77/02;H01L21/312;H01L21/314;H01L21/316 主分类号 C08J7/06
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