发明名称 |
COATING FLUID FOR FORMING LOW-PERMITTIVITY SILICA-BASED COATING FILM AND SUBSTRATE WITH LOW-PERMITTIVITY COATING FILM |
摘要 |
<p>A coating fluid capable of forming a silica-based coating film having a relative permittivity as low as 3 or below and a low density and excellent in resistance to oxygen plasma and suitability for other processings; and a substrate having a coating film having such properties. The coating fluid is characterized by comprising a polymer composition comprising (i) a polysiloxane which is a product of the reaction of fine silica particles with a hydrolyzate of at least one alkoxysilane represented by following general formula (I) and (ii) a readily decomposable resin; XnSi(OR)4-n (wherein X represents hydrogen, flourine, C1-8 alkyl, flouroalkyl, aryl, or vinyl; R represents hydrogen, C1-8 alkyl, aryl, or vinyl; and n is an integer of 0 to 3).</p> |
申请公布号 |
WO0012640(A1) |
申请公布日期 |
2000.03.09 |
申请号 |
WO1999JP04050 |
申请日期 |
1999.07.28 |
申请人 |
CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.;NAKASHIMA, AKIRA;KOMATSU, MICHIO |
发明人 |
NAKASHIMA, AKIRA;KOMATSU, MICHIO |
分类号 |
C09D5/25;C09D183/04;H01L21/3105;H01L21/312;(IPC1-7):C09D183/04;H05K3/46 |
主分类号 |
C09D5/25 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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