发明名称 |
PROCESS FOR OPTIMIZING MECHANICAL STRENGTH OF NANOPOROUS SILICA |
摘要 |
A process for forming a nanoporous dielectric coating on a substrate. The process includes forming a substantially uniform alkoxysilane gel composition on a surface of a substrate, which alkoxysilane gel composition comprises a combination of at least one alkoxysilane, an organic solvent composition, water, and an optional base catalyst; heating the substrate for a sufficient time and at a sufficient temperature in an organic solvent vapor atmosphere to thereby condense the gel composition; and then curing the gel composition to form a nanoporous dielectric coating having high mechanical strength on the substrate.
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申请公布号 |
WO0013221(A1) |
申请公布日期 |
2000.03.09 |
申请号 |
WO1999US18497 |
申请日期 |
1999.08.17 |
申请人 |
ALLIEDSIGNAL INC. |
发明人 |
WU, HUI-JUNG;DRAGE, JAMES, S.;BRUNGARDT, LISA, BETH;RAMOS, TERESA;SMITH, DOUGLAS, M.;WALLACE, STEPHEN;RODERICK, KEVIN |
分类号 |
C08J7/06;C01B33/152;C08G77/02;C09D183/02;H01L21/312;H01L21/316;H01L21/768;(IPC1-7):H01L21/316 |
主分类号 |
C08J7/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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