发明名称 ABRASIVE LIQUID FOR METAL AND METHOD FOR POLISHING
摘要 <p>An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.</p>
申请公布号 WO2000013217(P1) 申请公布日期 2000.03.09
申请号 JP1999004694 申请日期 1999.08.31
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