| 摘要 |
An arc jet CVD system includes a plurality of plasma jet distribution heads. The distribution heads are preferably linearly arranged, preferably angled relative to a line normal to the substrate surface on which a diamond film is being coated, and preferably spaced relatively apart with respect to a defined profile width. In addition, the plasma jets are preferably configured in accord with a defined parameter which is a function the reagent gas flow and viscosity, the distance between the distribution heads and the substrate, and the area on the substrate exposed to the gas from a distribution head. Configuring the plasma in accordance with the defined parameter-ensures an acceptable minimum level of efficiency with respect to hydrogen reagent use, and further provides a relatively uniform diamond film coating on a substrate. It is also preferable that the plurality of jets and substrate are preferably moved relative to one another during diamond film deposition for increased uniformity. The combination of the relative arrangement of the distribution heads, the configuration with respect to the defined parameter, the angling of the distribution heads, and the relative movement between the distribution heads and the substrate provide an efficiently operable system for manufacturing substantially uniform thickness diamond film.
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