发明名称 Dual beam laser device for linear and planar alignment
摘要 A high precision alignment apparatus is provided that utilizes a semiconductor laser device, such as a laser diode, to provide a source laser beam. The alignment apparatus permits the division of a pair of beam components from the source laser beam useful for either linear or planar alignment. A centroid measurement between the beam components provides a corrected reference point that accounts for the inherent instability of the source laser beam to yield a high level of alignment accuracy. For linear alignment purposes, the beam components are collinearly directed. In the alternative, for planar alignment purposes, the beam components may be either collinear or directed in opposite directions, and rotated to sweep respective planar regions. The laser alignment apparatus is capable of providing a level of accuracy heretofore achievable only with gas lasers, while maintaining the economical attributes of commercial semiconductor laser diodes.
申请公布号 US6034763(A) 申请公布日期 2000.03.07
申请号 US19980170626 申请日期 1998.10.13
申请人 NEARFIELD SYSTEMS INCORPORATED 发明人 SLATER, DAN;KRAMER, DAVID M.
分类号 G01B11/26;G01B11/27;G01C15/00;(IPC1-7):G01B11/26 主分类号 G01B11/26
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