| 摘要 |
The present invention relates to a capacitor and a method of fabricating the same including a semiconductor substrate, an impurity region in the semiconductor substrate, a first insulating layer on the semiconductor substrate, the first insulating layer having a first contact hole to expose the impurity region, a first conductive layer in the contact hole, a second conductive layer on the first insulating layer, a second insulating layer on the first insulating layer including the second conductive layer, the second insulating layer contacting the first portion of the second conductive layer, a lower electrode on the second insulating layer, the lower electrode being not directly contacting the first conductive layer, a dielectric layer on the lower electrode including the second insulating layer, and an upper electrode on the dielectric layer.
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