DEVICE AND METHOD FOR CLEANING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To enhance cleaning effect in a wafer sheet-fed spin cleaning device without giving damage to a substrate. SOLUTION: A wafer sheet-fed spin cleaning device feeds a cleaning liquid to front and rear surfaces of a substrate 102 and irradiates the front surface of the substrate 102 with ultraviolet rays and irradiates the rear surface with a high-frequency sound wave so as to clean the front and rear surfaces of the substrate 102. Because irradiation of the ultraviolet rays generates active species such as oxidizing radicals, various oxidizing species, ions and the like in the liquid, cleaning effect can be enhanced.