发明名称 Silicon-on-insulator body- and dual gate-coupled diode for electrostatic discharge (ESD) applications
摘要 A body and dual gate coupled diode for silicon-on-insulator (SOI) technology is disclosed. The body and dual gate coupled diode is formed from a SOI field-effect transistor (FET) structure. The source of the SOI FET structure forms the first terminal of the diode. The drain of the SOI FET structure forms the second terminal of the diode. The SOI FET structure includes two gates, which are tied to the body of the SOI FET structure. An SOI circuit comprising at least one body and dual gate coupled diode formed from the SOI FET structure provides electrostatic discharge (ESD) protection.
申请公布号 US6034397(A) 申请公布日期 2000.03.07
申请号 US19980002670 申请日期 1998.01.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 VOLDMAN, STEVEN H.
分类号 H01L27/02;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L27/02
代理机构 代理人
主权项
地址