| 摘要 |
A structure of metal contact portion of a semiconductor device, includes a semiconductor substrate having an impurity doped junction therein, an insulating layer pattern formed on the semiconductor substrate having a contact hole through the insulating layer pattern to expose the doped junction, a conductive projection formed directly on a portion of the doped junction, and a metal layer formed on opposite sides of the conductive projection and contacting the doped junction and the conductive projection, whereby a contact area for the doped junction is increased.
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