发明名称 |
Composition and process for autodeposition with modifying rinse of wet autodeposited coating film |
摘要 |
PCT No. PCT/US96/11833 Sec. 371 Date Jan. 26, 1998 Sec. 102(e) Date Jan. 26, 1998 PCT Filed Jul. 24, 1996 PCT Pub. No. WO97/04880 PCT Pub. Date Feb. 13, 1997The uniformity of gloss of a dried autodeposited resin film on a metal surface can be increased by rinsing the wet autodeposited film initially formed with an aqueous modifying rinse having a pH from 6 to 11 and comprising from 0.2 to 10.0 g/L in total of polymers of carboxylic acid monomers having an ethylenic double bond and salts thereof.
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申请公布号 |
US6033492(A) |
申请公布日期 |
2000.03.07 |
申请号 |
US19980000298 |
申请日期 |
1998.01.26 |
申请人 |
HENKEL CORPORATION |
发明人 |
HONDA, TAKUMI;HIROTA, MUTSUMI;HATANO, NORIFUMI |
分类号 |
B05D7/14;(IPC1-7):C23C8/00 |
主分类号 |
B05D7/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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