发明名称 Composition and process for autodeposition with modifying rinse of wet autodeposited coating film
摘要 PCT No. PCT/US96/11833 Sec. 371 Date Jan. 26, 1998 Sec. 102(e) Date Jan. 26, 1998 PCT Filed Jul. 24, 1996 PCT Pub. No. WO97/04880 PCT Pub. Date Feb. 13, 1997The uniformity of gloss of a dried autodeposited resin film on a metal surface can be increased by rinsing the wet autodeposited film initially formed with an aqueous modifying rinse having a pH from 6 to 11 and comprising from 0.2 to 10.0 g/L in total of polymers of carboxylic acid monomers having an ethylenic double bond and salts thereof.
申请公布号 US6033492(A) 申请公布日期 2000.03.07
申请号 US19980000298 申请日期 1998.01.26
申请人 HENKEL CORPORATION 发明人 HONDA, TAKUMI;HIROTA, MUTSUMI;HATANO, NORIFUMI
分类号 B05D7/14;(IPC1-7):C23C8/00 主分类号 B05D7/14
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