发明名称 Vacuum processing apparatus with low particle generating vacuum seal
摘要 A wafer processing apparatus is provided with sealing ports between adjacent evacuatable chambers that are actuated to compress elastomeric seals carried by the valve sealing elements to differing degrees of compression, based on the amount of pressure differential between the chambers when sealed. The degree of compression is controlled so that less compression of the seal takes place when less is required to seal, such as with lower pressure differentials, thereby avoiding unnecessary fatigue and wear of and around the seals that would otherwise increase the generation of particulate contamination.
申请公布号 US6032419(A) 申请公布日期 2000.03.07
申请号 US19970838383 申请日期 1997.04.08
申请人 TOKYO ELECTRON LIMITED 发明人 HURWITT STEVEN D.
分类号 F16K1/10;F16K51/02;H01L21/00;(IPC1-7):E06B7/16 主分类号 F16K1/10
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