发明名称 SUPPORTING STRUCTURE FOR SUBSTRATE IN VACUUM VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To uniformize the distribution of film thickness at the time of forming a thin film by a vacuum vapor deposition device. SOLUTION: A vapor depositing material 20 is evaporated at the bottom part of a vacuum vessel 14. A center axis 4 is put at the center of the upper wall 1402 of the vacuum vessel 14, and a fourth motor 38 is fitted to the lower part of the center axis 42. By the fourth motor 38, two third arms 30 rotate with a fourth virtual axis A4 as the center. The lower part of the tip part orientating toward the lower direction of a third arm 30 is provided with a primary motor 32, and, by the primary motor 32, a primary arm 26 rotates with a primary virtual axis Al as the center. The primary end part 2602 of the primary arm 26 is provided with a secondary motor 34, and, by the secondary motor 34, a secondary arm 28 rotates with a secondary axis A2 as the center. The place of the secondary arm 28 passing through a secondary virtual axis A3 orthogonal to the secondary virtual axis A2 is provided with a third mortor 36, and, by the third mortor 36, a holder 40 is rotated with the third virtual axis A3 as the center. A plurality of substrates 24 are supported by the holder 40.
申请公布号 JP2000073169(A) 申请公布日期 2000.03.07
申请号 JP19980244657 申请日期 1998.08.31
申请人 ASAHI OPTICAL CO LTD 发明人 ITO HIROSHI
分类号 C23C14/24;C23C14/50;(IPC1-7):C23C14/50 主分类号 C23C14/24
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