发明名称 Current-limiting semiconductor configuration
摘要 A semiconductor configuration includes a first semiconductor region which has a predetermined conductivity type and a first surface. There is a contact region disposed on the first surface of the first semiconductor region. There is a second semiconductor region disposed within the first semiconductor region underneath the contact region which has a conductivity type opposite the predetermined conductivity type of the first semiconductor region. A first p-n junction having a first depletion zone is formed between the first semiconductor region and the second semiconductor region. The second semiconductor region extends further than the contact region in all directions parallel to the first surface of the first semiconductor region to form at least one lateral channel region with a bottom in the first semiconductor region. The at least one lateral channel region is bounded toward its bottom by the first depletion zone of the first p-n junction. In an on state of the semiconductor configuration, the at least one lateral channel region conducts an electric current from the contact region or to the contact region.
申请公布号 US6034385(A) 申请公布日期 2000.03.07
申请号 US19980103168 申请日期 1998.06.22
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 STEPHANI, DIETRICH;MITLEHNER, HEINZ;WEINERT, ULRICH
分类号 H01L29/861;H01L29/10;H01L29/80;H01L29/808;H01L29/812;(IPC1-7):H01L29/68 主分类号 H01L29/861
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