发明名称 |
Micro etching system using laser ablation |
摘要 |
A micro etching system using laser ablation includes a laser generator, an optical fiber waveguide, a laser beam focusing device and a sample platform. The laser generator generates an ultraviolet beam, and the optical fiber waveguide carries the laser beam radiated from the laser generator to the material to be etched. The focusing device is provided between the laser generator and optical fiber waveguide and serves to concentrate the laser beam into the optical fiber. The sample platform controls the position of the material to be etched so that the material is etched at a predetermined angle by the beam emitted from the outlet of the optical fiber waveguide.
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申请公布号 |
US6034348(A) |
申请公布日期 |
2000.03.07 |
申请号 |
US19970932546 |
申请日期 |
1997.09.17 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
KIM, JE-HA;HAN, SEOK-KIL;KANG, KWANG-YONG |
分类号 |
H01L21/3065;B23K26/06;(IPC1-7):B23K26/00 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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