ISOLATION METHOD OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: An isolation method is provided to guarantee an active region by minimizing a length of a bird's beak and decrease a threshold voltage. CONSTITUTION: The isolation method comprises the steps of: forming an opening for making an isolation in a predetermined region of a material layer functioning as a mask layer evaporated on a semiconductor device; growing an epitaxial layer in the inside of the opening; and forming an isolation layer by oxidizing the semiconductor substrate on which the epitaxial layer is grown.