PRODUCTION PROCESS OF THIN FILM USING ATOMIC LAYER DEPOSITION

摘要

PURPOSE: The atomic layer deposition(ALD) is provided which shows high film density and excellent stoichiometry. CONSTITUTION: The production process of a thin film using ALD comprises the following steps of:(1) Adsorbing chemically a first reactant into a base plate by injecting the first reactant with keeping a chamber loaded at a uniform pressure and temperature; (2) Pumping or purging the chamber to eliminate the first physically-adsorbed reactant from the first chemically-adsorbed reactant; (3) Injecting the first reactant into the chamber again for close packed adsorption; (4) Repeating the second step; (5) Injecting the second reactant to adsorb it on the surface of the base plate; (6) Pumping or purging the chamber to eliminate the second physically-adsorbed reactant from the first and the second chemically-adsorbed reactant formed densely; and (7) Injecting the second reactant into the chamber and adsorbing it densely on the base plate to produce a solid thin film through chemical substitution.