LOWER ELECTRODE ASSEMBLY OF SEMICONDUCTOR ETCHING CHAMBER

摘要

PURPOSE: A lower electrode assembly of semiconductor etching chamber is provided to improve a uniformity degree of etching. CONSTITUTION: A vacuum opening makes vacuum and comes forward a reaction gas. the vacuum is installed on lower of a side in a etching chamber. A wafer is placed on a chuck. A guard ring is fixed to surround upper portion of the chuck to lead that the reaction gas uniformly flows on the wafer. The guard ring is installed on a side of the chuck near the vacuum opening. A plurality of holes are formed in center part of the guard ring to pass the reaction gas.