THE AR GAS SUPPLIER OF MANUFACTURING SEMICONDUCTOR DEVICE WITH SPUTTERING

摘要

PURPOSE: The Ar gas is supplied better on the backside of wafer in the course of sputtering to prevent the eutectic error. CONSTITUTION: A portion of Ar gas goes through the first controller(12) and the second controller(14) which are installed on the Ar gas supply line(10), when the amount of gas is controlled. After that, the gas goes to sputtering chamber(16). The gas goes through the first controller(12) and the third controller(30) which is installed on the second Ar gas ramification supply line(22), when the amount of gas is controlled. The gas goes to the inside of sputtering chamber(16) to supply Ar gas on the backside of wafer. The amount of gas is supplied evenly by auto-controlling of the third controller(30).