发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THEREOF
摘要 PURPOSE: A semiconductor device is provided to form a polysilicon resistor and an ESD(electro static discharge) protection element, simultaneously. CONSTITUTION: The semiconductor device is comprises a transistor consisted of a gate electrode and a source/drain region and a resistor element. A silicide layer is formed on a part of the source/drain region. A conductive layer is formed on the gate electrode and a partial region of the source/drain region does not formed the silicide layer. The conductive layer is made up a polysilicon doped an impurities.
申请公布号 KR20000013839(A) 申请公布日期 2000.03.06
申请号 KR19980032933 申请日期 1998.08.13
申请人 SAMSUNG ELECTRONIC CO., LTD. 发明人 KIM, DONG JUN
分类号 H01L21/28;(IPC1-7):H01L21/28 主分类号 H01L21/28
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