发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THEREOF |
摘要 |
PURPOSE: A semiconductor device is provided to form a polysilicon resistor and an ESD(electro static discharge) protection element, simultaneously. CONSTITUTION: The semiconductor device is comprises a transistor consisted of a gate electrode and a source/drain region and a resistor element. A silicide layer is formed on a part of the source/drain region. A conductive layer is formed on the gate electrode and a partial region of the source/drain region does not formed the silicide layer. The conductive layer is made up a polysilicon doped an impurities.
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申请公布号 |
KR20000013839(A) |
申请公布日期 |
2000.03.06 |
申请号 |
KR19980032933 |
申请日期 |
1998.08.13 |
申请人 |
SAMSUNG ELECTRONIC CO., LTD. |
发明人 |
KIM, DONG JUN |
分类号 |
H01L21/28;(IPC1-7):H01L21/28 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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