| 摘要 |
PROBLEM TO BE SOLVED: To suppress the generation of particles to well conduct a substrate heat treatment. SOLUTION: In a substrate heating chamber 21 a hot plate 22 for heating a substrate is provided. A shutter mechanism 30 is disposed in connection to a substrate pass hole 26 formed at the substrate heating chamber 21 and allows the operation mode to be switched over an opening/closing mode and normally opening mode. At the opening/closing mode, the substrate pass hole 26 is opened when the substrate is inserted or removed. During heat treatment of the substrate, the substrate pass hole 26 is held in a closed state. At the normally opening mode, the substrate pass hole 26 is held in a normally opened state. For a rigorous requirement for the in-plane uniformity of the substrate temp., the opening/closing mode is suited. For a less strict requirement for the in-plane uniformity of the substrate temp., the normally opening mode is adopted to suppress the generation of particles.
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