发明名称 FORMATION OF TRANSPARENT CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To easily obtain a transparent conductive film including indium oxide and tin oxide, having low resistance and superior in the stability in resistance by thermally decomposing a coating film including a indium compound and a tin compound at a specific temperature under non-oxidizable atmosphere, and repeating this process. SOLUTION: The coating liquid including an indium compound to obtain indium oxide by thermal decomposition and a tin compound to obtain tin oxide by thermal decomposition is applied to a glass base or the like. As the indium compound, indium nitrate or the like, and as the tin compound, a tin oxalate or the like can be preferably used, and the coating liquid is prepared by blending these compounds by about 95/5 through 80/20 of In/Sn atomic ratio and dissolving the same into alcohol or the like. This coating film is heated preferably under the oxidizing atmosphere to remove an organic component after being dried at about 50-150 deg.C when necessary, then a coating film is formed by heating the same at more than 300 deg.C under the non-oxidizing atmosphere of inert gas including above 2 vol.% of hydrogen, and this process is repeated again. On this occasion, a thickness of the coating film is preferably above 1/2 of a thickness of the total coating films.
申请公布号 JP2000067666(A) 申请公布日期 2000.03.03
申请号 JP19980236035 申请日期 1998.08.21
申请人 ASAHI GLASS CO LTD 发明人 TOMONAGA HIROYUKI;MORIMOTO TAKESHI
分类号 C03C17/27;H01B13/00;(IPC1-7):H01B13/00 主分类号 C03C17/27
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