| 摘要 |
PROBLEM TO BE SOLVED: To obtain a cleaning apparatus capable of miniaturizing an overall cleaning apparatus, and for simplifying the output of conditions for cleaning. SOLUTION: This cleaning apparatus 1 in this application is provided with a carrying robot 10, equipped with a first hand 14 and a second hand 15 for holding and moving an object to be cleaned at the central part. In this case, an object to be cleaned carrying device 20, hand cleaning device 30, object to be cleaned cleaning device 40, object to be cleaned cleaning and drying device 50, and object to be cleaned carrying device 60 are successively arranged around a robot 10 positioned at the center in the clockwise direction. Then, a wet semiconductor wafer is moved from the object to be cleaned carrying device 20 to the object to be cleaned cleaning device 40 and the object to be cleaned cleaning and the drying device 50 by the first hand 14, and a dry semiconductor wafer, which is cleaned and dried by the object to be cleaned cleaning and drying device 50, is moved to the object to be cleaned carrying device 60 by the second hand 15. |
