发明名称 SINUSOIDAL WAVELENGTH SCANNING INTERFEROMETER AND SINUSOIDAL WAVELENGTH SCANNING LIGHT SOURCE UNIT
摘要 PROBLEM TO BE SOLVED: To enable measuring an optical path difference of at least one wavelength with high precision by a sinusoidal wavelength scanning interferometer. SOLUTION: A sinusoidal wavelength scanning parallel light from an SWS light source unit 10 is divided via a beam splitter 20. One light enters a mirror 22 sinusoidally vibrated by a piezoelectric element 24, and the other light enters the measurement surface of an object to be measured. A light reflected by a reflecting surface (reference surface) of the mirror 22 and a light reflected by the measurement surface of the object to be measured are combined by the beam splitter 20 and interfere with each other. On the basis of an interference signal S(t) obtained in this manner, a signal showing sinusoidal phase change is obtained, and the amplitude and the phase of the signal are obtained. By using the obtained amplitude, optical path difference of at least one wavelength is obtained. By using the obtained phase, optical path difference of at most one wavelength is obtained. By combining both results, an optical path difference of at least one wavelength is calculated with high precision.
申请公布号 JP2000065517(A) 申请公布日期 2000.03.03
申请号 JP19980232003 申请日期 1998.08.18
申请人 TOKYO SEIMITSU CO LTD;SASAKI OSAMI 发明人 SASAKI OSAMI
分类号 G01B9/02;(IPC1-7):G01B9/02 主分类号 G01B9/02
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