| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method of a color filter whereby exposure processing of a photosensitive coloring resist can be performed without inconvenience, and as a result, a color filter can excellently be manufactured. SOLUTION: This is a method for manufacturing a patterned color filter by arranging a photosensitive coloring resist layer on a substrate 4 on which a lot of rectangular chip patterns P(1-6) are formed lengthwise and widthwise, and exposure-treating this photosensitive coloring resist layer with a reduction stepper. One shot-form of exposure treatment is made to be rectangular, and one dimension is made (a)times as long as a chip pattern dimension (however, (a) is a positive integer of 2 or larger). The exposure treatment is carried out by making a step pitch (c) times as long as the chip pattern dimension (however, (a) is a divisor of (a) and a positive integer smaller than (a)), and making one shot S exposure (c/a) times as much as the exposure necessary for the photosensitive coloring resist layer.</p> |
