| 摘要 |
PROBLEM TO BE SOLVED: To provide a scan type lithographic projector usable for manufacturing ICs, etc., wherein the exposure error of the projector occurs at the start and end of scan due to the reflection from a reticle mask blade and hence this is improved to make the slit illumination const. and uniform over the entire scan. SOLUTION: A controller 11 controls the opening-closing of a slit defined by a reticle mask blade 7. A part of light beam emitted from a light source 1 is picked up and detected by a sensor 6 and a lamp controller 10 adjusts so that the illumination intensity of the slit is const. The controllers 10, 11 are interlocked to compensate the illumination intensity increase when the mask blade 7 opens. The mask blade 7 is made of a transparent material and provided with a total reflector at the top end or a reflective film on the back surface to prevent the reflection to a reticle 8. |
