| 摘要 |
PROBLEM TO BE SOLVED: To obtain a composition superior in the stability in preservation or the like, and usable in the formation of a fine baked pattern of high aspect ratio by including (A) a polymer having at least two specific groups on its side chain and having a specific weight average molecular weight, (B) a compound generating acid by irradiation of active energy beam, (C) a dilution solvent and (D) glass frit. SOLUTION: A polymer having at least two groups represented by a formula I on its side chain and having 1000-50,000 average molecular weight is used. In the formula R1 is represented by a formula II or tert-butyl group, R2 is 1-18C alkyl group, or a group prepared by substituting a hydrogen atom of the alkyl group by 1-6C alkoxyl group. Preferably the polymer (A) is a resin prepared by blocking a carboxyl group of polycarboxylic acid resin of 60-300 mgKOH/g of solid acid value and about 1000-50,000 weight average molecular weight, by a group represented by R1, and the polycarboxylic acid resin is a copolymer resin of 8-40 wt.% of acrylic acid or methacrylic acid and another monomer. |
