发明名称 METHOD AND APPARATUS FOR ADJUSTMENT OF POSITION OF LIGHT- SOURCE ARRAY
摘要 PROBLEM TO BE SOLVED: To obtain a method and an apparatus in which the position of a light-source array can be adjusted at high speed and with high accuracy and whose costs can be reduced by a method wherein the position is adjusted on the basis of quantities of light of light beams which are passed through a plurality of aperture which are formed in corresponding positions on a scanning face and whose aperture area is different. SOLUTION: Quantities of light of four semiconductor lasers near the center of a semiconductor laser array 111 are captured by a photodetector 30 via a square hole 20. Positions in the X-axis direction and the Z-axis direction of the array 111 are adjusted roughly. Then, quantities of light of two laser beams near both ends in the X-axis direction are captured in the center in the Z-axis direction of the array 111 by optical sensors 3A, 3B via slits 2a, 2b, and the array 111 is turned around the Y-axis. In the same manner, quantities of light of two laser beams at both ends in the X-axis (or Z-axis) direction are captured by optical sensors 3C, 3D and 3E, 3F in the center in the Z-axis (or X-axis) direction of the array 111, and the array 111 is turned around the Z-axis and the X-axis). Lastly, a prescribed quantity of light is captured by the optical sensors 3C to 3F via pinholes 2c to 2f, and the array 111 is moved to Y-axis direction.
申请公布号 JP2000065685(A) 申请公布日期 2000.03.03
申请号 JP19980231346 申请日期 1998.08.18
申请人 FUJI XEROX CO LTD 发明人 KIMURA TETSUYA
分类号 G01M11/00;G03B27/32;(IPC1-7):G01M11/00 主分类号 G01M11/00
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