发明名称 APPARATUS AND METHOD FOR GRINDING NITRIDE SEMICONDUCTOR WAFERS
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and method for grinding nitride semiconductor wafers, which particularly prevents chipping, etc., at the rim of a semiconductor wafer and has high yield and excellent productivity. SOLUTION: In an apparatus for grinding wherein nitride semiconductor wafers 102 are placed on the grinding machine of a grinder and ground with a grinding wheel 104, dummy works 101 aside from the nitride semiconductor wafers 102 are provided adjacent to the rims of the nitride semiconductor wafers 102 placed on the grinding machine and ground together with the nitride semiconductor wafers 102, allowing the nitride semiconductor wafers 102 and the grinding wheel 104 to be uniformly pressed and ground.
申请公布号 JP2000068556(A) 申请公布日期 2000.03.03
申请号 JP19980236906 申请日期 1998.08.24
申请人 NICHIA CHEM IND LTD 发明人 SHONO HIROBUMI;TOYODA TATSUNORI
分类号 H01L33/32 主分类号 H01L33/32
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