| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high resolution and high sensitivity resist compsn. which eliminates a harmful effect due to an amine, is faithful to a mask pattern and does not sustain the damage of pattern shape during, the time from image formation to post exposure baking, that is, has excellent aging stability. SOLUTION: (A) A component which generates an acid when irradiated, (B) a resin component whose solubility to an aq. alkali soln. is increased by the action of the acid and (C) an amine component are dissolved as basic components in an org. solvent and (D) an org. carboxylic acid is added to the resultant soln. to obtain the objective coating fluid for forming a positive type resist film. The contents of the components C and D are 0.01-1 wt.% and 0.01-5 wt.%, respectively, based on the weight of the component B. The coating fluid is a chemical amplification type resist compsn., forms a resist pattern having good aging stability and is suitable for fine working in the production of super- LSI because it has high resolution and high sensitivity. |
