POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING SAME

摘要

PROBLEM TO BE SOLVED: To obtain a positive type resist compsn. excellent in sensitivity and resolution and capable of forming a resist pattern perpendicular to a substrate with a disposed thin film without causing trailing in a cross section and to provide a resist pattern forming method using resist compsn. SOLUTION: An oxo acid of phosphorus or its deriv. is added to a radiation sensitive positive type resist contg. a combination of a resin component whose solubility to an alkaline aq. soln. is increased by the action of an acid and an acid generating component which generates the acid when irradiated to obtain the objective positive type resist compsn. A coating film of the resist compsn. is disposed on a substrate with a disposed thin film, exposed through a mask pattern, heated and developed to form the objective resist pattern.