MINUTE PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method capable of stably forming a minute pattern on a surface of a substrate with a comparatively low applied voltage without breaking a probe and the surface of the substrate. SOLUTION: A probe 2 with a sharp tip is approached onto a surface of a substrate whose bonds of the surface are terminated with a different substance so that a substance provided on a tip part of the probe 2 chemically reacts with the different substance on the surface of the substrate. Thereby, a substance state of the surface of the substrate is partially changed so that a pattern mask of an atomic size is formed on the substrate. By this minute pattern forming method, a mask pattern for a silicon-based integrated circuit, or the like, can be formed with ease.