| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist material excellent in PED stability, preventing trailing phenomenon a basic substrate, having a wide focus margin and capable of forming a pattern suitable for precise fine working by incorporating an α,β,γ,δ-unsatd. cyclic carbonyl compd. SOLUTION: The resist material contains an α,β,γ,δ-unstad. cyclic carbonyl compd., an org. solvent, an alkali-insoluble or slightly alkali-soluble base resin having an acidic functional group protected with an acid labile group and an acid generating agent and preferably contains a basic compd. The resin has a wt. average mol.wt. of 5,000-100,000 and is made alkali-soluble when the acid labile group is released. The resist material is excellent in PED stability, hardly causes trailing phenomenon on a basic substrate, has a wide focus margin, is excellent in adaptability to a process and can form a pattern suitable for precise fine working. |
