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发明名称
RESIST COMPOSITION AND PATTERN FORMING METHOD THEREOF AND SEMICONDUCTOR MANUFACTURING METHOD
摘要
申请公布号
KR100242224(B1)
申请公布日期
2000.03.02
申请号
KR19970032341
申请日期
1997.07.11
申请人
FUJITSU LIMITED
发明人
NOZAKI, KOJI;YANO, EI;WATANABE, KEIJI;NAMIKI, TAKAHISA;IGARASHI, MIWA
分类号
H01L21/3065;G03F7/004;G03F7/039;G03F7/40;H01L21/027;H01L21/302;(IPC1-7):G03F7/004
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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