发明名称 METHOD OF FORMING DIAMOND LIKE CARBON FILM(DLC), DLC FILM FORMED THEREBY, USE OF THE SAME, FIELD EMITTER ARRAY AND EMITTER CATHODES
摘要 <p>PCT No. PCT/KR96/00192 Sec. 371 Date Jul. 2, 1997 Sec. 102(e) Date Jul. 2, 1997 PCT Filed Nov. 2, 1996 PCT Pub. No. WO97/16580 PCT Pub. Date May 9, 1997The present invention relates to a method for forming substantially hydrogen free DLC layers, wherein DLC layer of thickness about 1 to 100 nanometers is deposited over a sample substrate or a field emitter array and subsequently exposed to etching plasma comprising fluorine gas, wherein during the latter step, hydrogen contained in the substrate is eliminated by chemical etching reaction with fluorine, wherein steps to form the hydrogen free DLC layer can be repeated to obtain a predetermined thickness of a DLC film.</p>
申请公布号 KR100245910(B1) 申请公布日期 2000.03.02
申请号 KR19977000936 申请日期 1997.02.12
申请人 JANG, JIN 发明人 JANG, JIN;PARK, KYU-CHANG
分类号 C01B31/06;C23C14/06;C23C14/58;C23C16/26;C23C16/27;C23F4/00;C30B25/00;C30B29/04;H01J9/02;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C30B25/00 主分类号 C01B31/06
代理机构 代理人
主权项
地址