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发明名称
METHOD FOR PRODUCING A DOPED POLYCIDE LAYER ON A SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
KR100241170(B1)
申请公布日期
2000.03.02
申请号
KR19910018777
申请日期
1991.10.23
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
SCHWALKE, UDO;BURMESTER, RALF
分类号
H01L21/28;H01L21/3215;H01L21/336;H01L21/8238;H01L27/092;H01L29/78;(IPC1-7):H01L21/320
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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