发明名称 THERMAL- AND PHOTOINITIATED RADICAL POLYMERIZATION IN THE PRESENCE OF AN ADDITION FRAGMENTATION AGENT
摘要 The invention relates to a composition comprising a) at least one ethylenically unsaturated monomer or oligomer, b) a radical initiator which forms a radical upon heating or upon irradiation with (UV) light from 305 nm to 450 nm and c) a compound of formula (Ia), (Ib) or (Ic), wherein Y is a group which activates the double bond towards Michael addition; X is halogen or the anion of a mono carboxylic acid from 1-12 carbon atoms, a monovalent oxo acid or complex acid; n is 0 or 1; R1, R2, R3 are independently of each other hydrogen, unsubstituted C1-C18alkyl, C3-C18alkyl, interrupted by at least one nitrogen or oxygen atom, C3-C18alkenyl, C3-C18alkynyl, C7- C9phenylalkyl, C3-C12cycloalkyl or C3-C12cycloalkyl containing at least one nitrogen or oxygen atom; or C1-C18alkyl or C3-C18alkyl interrupted by at lea st one nitrogen or oxygen atom, C3-C18alkenyl, C3-C18alkynyl, C7-C9phenylalkyl, C3-C12cycloalkyl or C3-C12cycloalkyl containing at least one nitrogen or oxygen atom, which are substituted by NO2, halogen, amino, hydroxy, cyano, carboxy, C1-C4alkoxy, C1-C4alkylthio, C1-C4alkylamino, C1-C4alkylamino, di(C 1- C4alkyl)amino or by a group -O-C(O)-C1-C18alkyl; or phenyl, naphthyl, which are unsubstituted or substituted by C1-C4alkyl, C1-C4alkoxy, C1-C4alkylthio, halogen, cyano, hydroxy, carboxy, C1-C4alkylamino or di(C1-C4alkyl)amino; or R1 and R2, together with the linking hetero atom, form a C3- C12heterocycloalkyl radical; or R1 and R2 form a group: (a), (b), or R1, R2 and R3 form a group: (c) or (d). Further subjects of the invention are a process for polymerization, the use of compounds of formulae (Ia), (Ib), (Ic ) in such a process, polymers obtainable by said process and new compounds useful as addition fragmentation agents.
申请公布号 CA2337428(A1) 申请公布日期 2000.03.02
申请号 CA19992337428 申请日期 1999.08.10
申请人 CIBA SPECIALTY CHEMICALS HOLDING INC. 发明人 SCHUWEY, ANNE;MURER, PETER;DESOBRY, VINCENT
分类号 C07D295/02;C07C211/28;C07C211/63;C07C219/06;C07C229/30;C07C255/30;C07C381/12;C07D213/20;C07D233/58;C07D333/46;C07D487/04;C07D521/00;C07F5/02;C07F9/54;C08F2/38;C08F2/48;C08F2/50;G03F7/027;G03F7/029;(IPC1-7):C08F2/50 主分类号 C07D295/02
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