ANALYZING METHOD OF METAL ALLOY FOR SEMICONDUCTOR MANUFACTURING PROCESS,申请号KR19970007783-传众专利搜索

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发明名称	ANALYZING METHOD OF METAL ALLOY FOR SEMICONDUCTOR MANUFACTURING PROCESS
摘要
申请公布号	KR100244922(B1)	申请公布日期	2000.03.02
申请号	KR19970007783	申请日期	1997.03.07
申请人	SAMSUNG ELECTRONICS CO, LTD.	发明人	MUN, SUNG-TAEK;CHOI, SUNG-PIL;LEE, DONG-JUN
分类号	H01L21/66;(IPC1-7):H01L21/66	主分类号	H01L21/66
代理机构		代理人
主权项
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