发明名称 METHOD FOR FORMING A PARTICLE LAYER ON A SUBSTRATE, METHOD FOR FLATTENING AN IRREGULAR SUBSTRATE SURFACE, AND PARTICLE-LAYERED SUBSTRATE
摘要 The present invention provides a method of forming on a substrate a particle layer highly adherent to the substrate, which comprises the steps of spreading a dispersion (I) comprising a dispersing medium and, dispersed therein, solid particles being surface treated with a compound acting as a binder on a liquid (II) having a specific gravity higher than that of the dispersing medium, said liquid (II) being immiscible with the dispersing medium, subsequently removing the dispersing medium from the dispersion (I) to thereby arrange the solid particles on the liquid (II) so that a particle layer is formed on the liquid (II) and thereafter transferring the particle layer onto a substrate. Moreover, the present invention provides a method of planarizing an irregular surface of a substrate, which comprises transferring the above particle layer to an irregular surface of a substrate and removing parts of the particle layer formed on protrudent parts of the substrate to thereby planarize the irregular surface of the substrate and also provides a particle-layer-formed substrate comprising a substrate and, superimposed on a surface thereof, the particle layer obtained by each of the above methods. <IMAGE>
申请公布号 EP0728531(B1) 申请公布日期 2000.03.01
申请号 EP19950928022 申请日期 1995.08.11
申请人 CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. 发明人 NAKASHIMA, AKIRA;KOMATSU, MICHIO;OHNO, KENJI;TERAMOTO, KUNIHARU;INOUE, KAZUAKI
分类号 B01J19/00;B05D1/20;G11B5/84;G11B7/26;H01L21/768;(IPC1-7):B05D1/20 主分类号 B01J19/00
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