发明名称 Method of manufacturing a thin-film transistor
摘要 The present invention provides a thin-film transistor (TFT) and its production method which enables an arrangement restraining bipolar transistor type behavior, in order to stabilize saturation current and to provide a TFT that can improve reliability. The TFT includes a channel region facing a gate electrode through a gate insulating film, a source electrode connected to the channel region and a drain region connected to the channel region on the side opposite this source region are formed in a polycrystal semiconductor film that was patterned in island forms. In the channel region, a recombination center is formed for capturing a small number of carriers (holes) by introducing impurities, such as inert gases, metals, Group III elements, Group IV elements and Group V elements after a crystallization process is carried out on a semiconductor film 100.
申请公布号 GB0000374(D0) 申请公布日期 2000.03.01
申请号 GB20000000374 申请日期 2000.01.07
申请人 SEIKO EPSON CORPORATION 发明人
分类号 H01L21/20;H01L21/336;H01L29/786 主分类号 H01L21/20
代理机构 代理人
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