SINGLE SUBSTRATE TYPE MAGNETRON SPUTTERING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an apparatus which is capable of mounting masks on disk substrates and subjects the disk substrates to sputtering while rotating these substrates around the central axis thereof. SOLUTION: A magnetic field generator is arranged above a sputtering chamber 11 for forming an electric discharge space so as to impress a magnetic field to the inside of the sputtering chamber 11. A target 21 is arranged in the upper part in the sputtering chamber 11. The sputtering chamber 11 is successively provided with a disk transporting chamber 12 via an aperture 32 formed at a barrier 30 constituting the bottom of the sputtering chamber 11. The disk transporting chamber 12 is internally provided with a disk pusher 34 which is loaded with the disk substrate 31 for forming sputter films, transports the substrate to the aperture 32 of the sputtering chamber 11 and rotates the disk substrate 31 within its plane. A supporting bar 52 is bridged and fixed in the aperture 32 communicating the sputtering chamber 11 and the disk transporting chamber 12 across the aperture 32 through the central part thereof. The central part thereof is provided with a center mask 51 rotatably by means of a revolving bearing 53.