| 发明名称 |
Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
| 摘要 |
A system and method for reproducing isolated images over an entire substrate, by creating multiple adjacent scanned strips of whole images using a unity magnification scanning photolithographic system.
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| 申请公布号 |
US6031597(A) |
申请公布日期 |
2000.02.29 |
| 申请号 |
US19970950237 |
申请日期 |
1997.10.14 |
| 申请人 |
KNIRCK, JEFFREY G.;SWANSON, PAUL A. |
发明人 |
KNIRCK, JEFFREY G.;SWANSON, PAUL A. |
| 分类号 |
G03F7/20;(IPC1-7):G03B27/42 |
主分类号 |
G03F7/20 |
| 代理机构 |
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| 地址 |
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