发明名称 Light exposure mask
摘要 Attention is paid to the shifting of a focal point depth due to an interference between some light penetrating even a light shielding film, that is, a light shielding film having a nonzero transmittance, and light passing through an opening. Study has been made about how both the transmittance of the light shielding film and the phase difference between the light penetrating the light shielding film and light passing through a light transmitting medium the same in thickness as the light shielding film vary, arriving at a conclusion that the broadest focal point tolerance can be obtained if a phase difference of substantially nx pi (n: an positive integer) exists between light penetrating the light shielding film and light passing through the light transmitting medium.
申请公布号 US6030729(A) 申请公布日期 2000.02.29
申请号 US19980079170 申请日期 1998.05.15
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ITO, SHINICHI;KAWANO, KENJI;TANAKA, SATOSHI
分类号 G03F1/08;G03F1/00;G03F1/30;G03F1/68;H01L21/027;(IPC1-7):G03F9/00 主分类号 G03F1/08
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