发明名称 |
Plasma ion mass analyzing apparatus |
摘要 |
A mechanism is provided for reducing contamination of the interior of an apparatus by a sample and for performing a stable measurement. An ion lens has an Einzel lens for converging an ion beam, a deflector for deflecting the ion beam and a pair of compensation electrodes each composed of one or more elements. A mechanism is provided for controlling a voltage to be applied to each of the electrodes as desired. Also, alternatively, a shield plate is provided in a flow path of the ion beam. A drive mechanism is provided for projecting and retracting the shield plate. With such an arrangement, it is possible not only to effectively detect a small amount of impurities contained in a sample but also to stably measure the concentration thereof.
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申请公布号 |
US6031379(A) |
申请公布日期 |
2000.02.29 |
申请号 |
US19960724996 |
申请日期 |
1996.10.03 |
申请人 |
SEIKO INSTRUMENTS, INC. |
发明人 |
TAKADA, SHINICHI;NAKAGAWA, YOSHITOMO |
分类号 |
G01N27/62;H01J49/06;H01J49/10;H01J49/22;H01J49/26;(IPC1-7):G01N27/62;H01J49/20;B01D59/44 |
主分类号 |
G01N27/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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