发明名称 Plasma ion mass analyzing apparatus
摘要 A mechanism is provided for reducing contamination of the interior of an apparatus by a sample and for performing a stable measurement. An ion lens has an Einzel lens for converging an ion beam, a deflector for deflecting the ion beam and a pair of compensation electrodes each composed of one or more elements. A mechanism is provided for controlling a voltage to be applied to each of the electrodes as desired. Also, alternatively, a shield plate is provided in a flow path of the ion beam. A drive mechanism is provided for projecting and retracting the shield plate. With such an arrangement, it is possible not only to effectively detect a small amount of impurities contained in a sample but also to stably measure the concentration thereof.
申请公布号 US6031379(A) 申请公布日期 2000.02.29
申请号 US19960724996 申请日期 1996.10.03
申请人 SEIKO INSTRUMENTS, INC. 发明人 TAKADA, SHINICHI;NAKAGAWA, YOSHITOMO
分类号 G01N27/62;H01J49/06;H01J49/10;H01J49/22;H01J49/26;(IPC1-7):G01N27/62;H01J49/20;B01D59/44 主分类号 G01N27/62
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