Nieuw fotoresistmonomeer met hydroxygroep en carboxylgroep, copolymeer daarvan en fotoresistcompositie waarin dit gebruikt wordt.

摘要

The present invention relates to novel monomers which can be used to form polymers which are useful in a photolithography employing a light source in the far ultraviolet region of the light spectrum, copolymers thereof, and photoresist compositions prepared therefrom. Photoresist monomers of the present invention are represented by the following Chemical Formula 1:wherein,R is substituted or non-substituted linear or branched (C1-C10) alkyl, substituted or non-substituted (C1-C10) ether, substituted or non-substituted (C1-C10) ester, or substituted or non-substituted (C1-C10) ketone;X and Y are independently CH2, CH2CH2, oxygen or sulfur; andi is 0 or an integer of 1 to 2.