发明名称 Method for removing the carbon halo caused by FIB clear defect repair of a photomask
摘要 A method of repairing clear defects on a template such as a mask or reticle that includes the steps of directing a focused ion beam (FIB) to fill the clear defect with a carbon film and directing a FIB in the presence of a water containing gas to remove the carbon halo from around the clear defect repair area. The end of the carbon halo removal process may be detected by monitoring a change in the intensity of a secondary signal. The template is exposed to a basic solution to remove ion stains produced by the FIB. According to this method, clear defects are repaired and the carbon halo formed around the clear defect repair area of the template are removed.
申请公布号 US6030731(A) 申请公布日期 2000.02.29
申请号 US19980190057 申请日期 1998.11.12
申请人 MICRON TECHNOLOGY, INC. 发明人 YANG, BAORUI
分类号 G03F1/00;(IPC1-7):G03F9/00 主分类号 G03F1/00
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