发明名称 |
TITANIUM SILICIDE TARGET AND ITS PRODUCTION |
摘要 |
PROBLEM TO BE SOLVED: To provide a titanium silicide target which can suppress production of particles to an extremely low level and to provide a producing method of the target. SOLUTION: This titanium silicide target has the molar ratio of Si/Ti ranging >=0.3 to <0.6, and the target is preferably prepared to have two kinds of phases of a Ti5Si3 phase and a Ti phase as the inner compsns. The target is obtd. by mixing TiH2 powder and Si powder in the molar ratio Si/Ti ranging >=0.3 to <0.6, heating the mixture to synthesize titanium silicide powder and then sintering it. |
申请公布号 |
JP2000064032(A) |
申请公布日期 |
2000.02.29 |
申请号 |
JP19980232482 |
申请日期 |
1998.08.19 |
申请人 |
JAPAN ENERGY CORP |
发明人 |
KANANO OSAMU;ODA KUNIHIRO;MIYASHITA HIROHITO;IRUMADA SHIYUUICHI |
分类号 |
C04B35/58;B22F3/14;C23C14/34;H01L21/285;H01L21/3205 |
主分类号 |
C04B35/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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