| 摘要 |
PROBLEM TO BE SOLVED: To improve the availability of a CF resist and to make a flat coating film uniform in thickness by applying a resist while rotating a large-size substrate, spreading the resist by centrifugal force, prebaking, exposing and developing. SOLUTION: A CF resist 2 is applied to larger thickness before dried than the required thickness on the surface of a large-size substrate 1 where the substrate is cut into a substrate for a liquid crystal panel. The large-size substrate 1 is mounted on a rotating mount and rotated to spread the CF resist 2 by centrifugal force so that the surface of the resist in a specified area is scattered to make a uniform flat face. In the area except for the specified area, the CF resist 2 is not enough supplied to make complete uniform thickness. However, this area is to be discarded wasted and the CF resist 2 is not formed to uniform film thickness in the unnecessary part. Then the resist is prebaked, exposed and developed to leave the CF resist 2 while other part is removed. Then the CF resist 2 is cured and fixed in an oven to form a color filter 4 of a desired pattern. |
